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- 2002278891 alternative "Photomask and X-ray mask technology.".
- 2002278891 contributor B9276641.
- 2002278891 contributor B9276642.
- 2002278891 created "c2001.".
- 2002278891 date "2001".
- 2002278891 date "c2001.".
- 2002278891 dateCopyrighted "c2001.".
- 2002278891 description "Includes bibliographical references and index.".
- 2002278891 extent "xv, 738 p. :".
- 2002278891 identifier "0819441112".
- 2002278891 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 4409.".
- 2002278891 isPartOf "SPIE proceedings series ; v. 4409".
- 2002278891 issued "2001".
- 2002278891 issued "c2001.".
- 2002278891 language "eng".
- 2002278891 publisher "Bellingham, Wash. : SPIE,".
- 2002278891 subject "621.3815/31 21".
- 2002278891 subject "Integrated circuits Masks Congresses.".
- 2002278891 subject "Masks (Electronics) Congresses.".
- 2002278891 subject "Microlithography Congresses.".
- 2002278891 subject "Optoelectronic devices Design and construction Congresses.".
- 2002278891 subject "TK7872.M3 P4623 2001".
- 2002278891 subject "X-ray lithography Congresses.".
- 2002278891 title "Photomask and next-generation lithography mask technology VIII : 25-27 April 2001, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City.".
- 2002278891 type "text".