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- 2002283519 contributor B9282324.
- 2002283519 contributor B9282325.
- 2002283519 created "c2001.".
- 2002283519 date "2001".
- 2002283519 date "c2001.".
- 2002283519 dateCopyrighted "c2001.".
- 2002283519 description "Includes bibliographical references and author index.".
- 2002283519 extent "2 v. (xxix, 1084 p.) :".
- 2002283519 identifier "0819440310".
- 2002283519 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 4345.".
- 2002283519 isPartOf "SPIE proceedings series ; v. 4345".
- 2002283519 issued "2001".
- 2002283519 issued "c2001.".
- 2002283519 language "eng".
- 2002283519 publisher "Bellingham, Washington : SPIE,".
- 2002283519 subject "621.3815/31 21".
- 2002283519 subject "Microlithography Congresses.".
- 2002283519 subject "Photoresists Congresses.".
- 2002283519 subject "TR940 .A38 2001".
- 2002283519 title "Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA / Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.".
- 2002283519 type "text".