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- 2002512442 contributor B9462105.
- 2002512442 contributor B9462106.
- 2002512442 created "c2002.".
- 2002512442 date "2002".
- 2002512442 date "c2002.".
- 2002512442 dateCopyrighted "c2002.".
- 2002512442 description "Includes bibliographical references and author index.".
- 2002512442 extent "2 v. (xiv, 950 p.) :".
- 2002512442 identifier "0819444340".
- 2002512442 isPartOf "Proceedings of SPIE ; v. 4688".
- 2002512442 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 4688.".
- 2002512442 issued "2002".
- 2002512442 issued "c2002.".
- 2002512442 language "eng".
- 2002512442 publisher "Bellingham, Washington : SPIE,".
- 2002512442 subject "621.3815/31 21".
- 2002512442 subject "Lithography, Electron beam Congresses.".
- 2002512442 subject "Masks (Electronics) Congresses.".
- 2002512442 subject "Microlithography Industrial applications Congresses.".
- 2002512442 subject "TK7874 .E526 2002".
- 2002512442 subject "X-ray lithography Congresses.".
- 2002512442 subject "X-rays Industrial applications Congresses.".
- 2002512442 title "Emerging lithographic technologies VI : 5-7 March, 2002, Santa Clara, [California], USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.".
- 2002512442 type "text".