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- 2003047499 contributor B9537789.
- 2003047499 contributor B9537790.
- 2003047499 created "2003.".
- 2003047499 date "2003".
- 2003047499 date "2003.".
- 2003047499 dateCopyrighted "2003.".
- 2003047499 description "Includes bibliographical references and index.".
- 2003047499 extent "xi, 273 p. :".
- 2003047499 identifier "1402012489 (alk. paper)".
- 2003047499 identifier 2003047499-d.html.
- 2003047499 identifier 2003047499-t.html.
- 2003047499 issued "2003".
- 2003047499 issued "2003.".
- 2003047499 language "eng".
- 2003047499 publisher "Dordrecht ; Boston : Kluwer Academic Publishers,".
- 2003047499 subject "671.7/35 21".
- 2003047499 subject "Refractory coating.".
- 2003047499 subject "TS695 .D63 2003".
- 2003047499 subject "Vapor-plating.".
- 2003047499 title "Principles of chemical vapor deposition / by Daniel M. Dobkin and Michael K. Zuraw.".
- 2003047499 type "text".