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- 2003054987 contributor B9545991.
- 2003054987 contributor B9545992.
- 2003054987 created "c2003.".
- 2003054987 date "2003".
- 2003054987 date "c2003.".
- 2003054987 dateCopyrighted "c2003.".
- 2003054987 description "Includes bibliographical references and index.".
- 2003054987 extent "x, 155 p. :".
- 2003054987 identifier "140207543X".
- 2003054987 identifier 2003054987-d.html.
- 2003054987 identifier 2003054987-t.html.
- 2003054987 issued "2003".
- 2003054987 issued "c2003.".
- 2003054987 language "eng".
- 2003054987 publisher "Boston : Kluwer Academic,".
- 2003054987 subject "621.3815/2 21".
- 2003054987 subject "Cathode sputtering (Plating process)".
- 2003054987 subject "TS695 .B27 2003".
- 2003054987 subject "Thin films.".
- 2003054987 title "Pulsed and pulsed bias sputtering : principles and applications / by Edward V. Barnat, Toh-Ming Lu.".
- 2003054987 type "text".