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- 2003268042 contributor B9581182.
- 2003268042 contributor B9581183.
- 2003268042 created "c2001.".
- 2003268042 date "2001".
- 2003268042 date "c2001.".
- 2003268042 dateCopyrighted "c2001.".
- 2003268042 description "Includes bibliographical references and index.".
- 2003268042 extent "vii, 422 p. :".
- 2003268042 identifier "0819441058".
- 2003268042 isPartOf "Proceedings / SPIE--the International Society for Optical Engineering ; v. 4404".
- 2003268042 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 4404.".
- 2003268042 issued "2001".
- 2003268042 issued "c2001.".
- 2003268042 language "eng".
- 2003268042 publisher "Bellingham, Wash. : SPIE,".
- 2003268042 subject "Integrated circuits Design and construction Congresses.".
- 2003268042 subject "Integrated circuits Very large scale integration Congresses.".
- 2003268042 subject "Microlithography Congresses.".
- 2003268042 subject "Semiconductors Etching Congresses.".
- 2003268042 subject "TK7874 .L56 2001".
- 2003268042 title "Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK / Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)".
- 2003268042 type "text".