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- 2003268492 contributor B9581766.
- 2003268492 contributor B9581767.
- 2003268492 created "c2002.".
- 2003268492 date "2002".
- 2003268492 date "c2002.".
- 2003268492 dateCopyrighted "c2002.".
- 2003268492 description "Includes bibliographical references and author index.".
- 2003268492 extent "2 v. (xl, 1204 p.) :".
- 2003268492 identifier "0819444359".
- 2003268492 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 4689.".
- 2003268492 isPartOf "SPIE proceedings series ; v. 4689".
- 2003268492 issued "2002".
- 2003268492 issued "c2002.".
- 2003268492 language "eng".
- 2003268492 publisher "Bellingham, Washington : SPIE,".
- 2003268492 subject "Integrated circuits Inspection Congresses.".
- 2003268492 subject "Integrated circuits Measurement Congresses.".
- 2003268492 subject "Microlithography Congresses.".
- 2003268492 subject "Process control Congresses.".
- 2003268492 subject "TK7874 .M43763 2002".
- 2003268492 title "Metrology, inspection, and process control for microlithography XVI : 4-7 March, 2002, Santa Clara, [California] USA / Daniel J.C. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.".
- 2003268492 type "text".