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- 2003268660 contributor B9581989.
- 2003268660 contributor B9581990.
- 2003268660 created "c2002.".
- 2003268660 date "2002".
- 2003268660 date "c2002.".
- 2003268660 dateCopyrighted "c2002.".
- 2003268660 description "Includes bibliographic references and author index.".
- 2003268660 extent "2 v. :".
- 2003268660 identifier "0819444375".
- 2003268660 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 4691.".
- 2003268660 isPartOf "SPIE proceedings series ; v. 4691".
- 2003268660 issued "2002".
- 2003268660 issued "c2002.".
- 2003268660 language "eng".
- 2003268660 publisher "Bellingham, Washington SPIE,".
- 2003268660 subject "621.3815/31 21".
- 2003268660 subject "Integrated circuits Masks Congresses.".
- 2003268660 subject "Manufacturing processes Congresses.".
- 2003268660 subject "Microlithography Congresses.".
- 2003268660 subject "TK7835 .O664 2002".
- 2003268660 subject "X-ray lithography Congresses.".
- 2003268660 title "Optical microlithography XV : 5-8 March, 2002, Santa Clara, [California], USA / Anthon Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.".
- 2003268660 type "text".