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- 2003268664 contributor B9581998.
- 2003268664 contributor B9581999.
- 2003268664 created "c2002.".
- 2003268664 date "2002".
- 2003268664 date "c2002.".
- 2003268664 dateCopyrighted "c2002.".
- 2003268664 description "Includes bibliographic references and author index.".
- 2003268664 extent "2 v. :".
- 2003268664 identifier "0819444367".
- 2003268664 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 4690.".
- 2003268664 isPartOf "SPIE proceedings series ; v. 4690".
- 2003268664 issued "2002".
- 2003268664 issued "c2002.".
- 2003268664 language "eng".
- 2003268664 publisher "Bellingham, Washington : SPIE,".
- 2003268664 subject "621.3815/31 21".
- 2003268664 subject "Microlithography Congresses.".
- 2003268664 subject "Photoresists Congresses.".
- 2003268664 subject "TK7874 .A3379 2002".
- 2003268664 title "Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA / Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.".
- 2003268664 type "text".