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- 2003269345 alternative "BACUS Symposium on Photomask Technology".
- 2003269345 alternative "Photomask technology".
- 2003269345 alternative "Symposium on Photomask Technology and Management".
- 2003269345 contributor B9582878.
- 2003269345 contributor B9582879.
- 2003269345 contributor B9582880.
- 2003269345 created "c2002.".
- 2003269345 date "2002".
- 2003269345 date "c2002.".
- 2003269345 dateCopyrighted "c2002.".
- 2003269345 description "Includes bibliographical references and author index.".
- 2003269345 extent "2 v. :".
- 2003269345 identifier "0819446750".
- 2003269345 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 4889.".
- 2003269345 isPartOf "SPIE proceedings series ; v. 4889".
- 2003269345 issued "2002".
- 2003269345 issued "c2002.".
- 2003269345 language "eng".
- 2003269345 publisher "Bellingham, Wash. : SPIE,".
- 2003269345 subject "621.3815/31 21".
- 2003269345 subject "Integrated circuits Masks Congresses.".
- 2003269345 subject "Microlithography Congresses.".
- 2003269345 subject "TK7874 .S9435 2002".
- 2003269345 title "22nd Annual BACUS Symposium on Photomask Technology : 1-4 October, 2002, Monterey, California, USA / Brian J. Grenon, Kurt R. Kimmel, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.".
- 2003269345 title "BACUS Symposium on Photomask Technology".
- 2003269345 title "Photomask technology".
- 2003269345 title "Symposium on Photomask Technology and Management".
- 2003269345 type "text".