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- 2003273206 alternative "BACUS Symposium on Photomask Technology".
- 2003273206 alternative "Photomask technology".
- 2003273206 alternative "Symposium on Photomask Technology and Management".
- 2003273206 contributor B9587639.
- 2003273206 contributor B9587640.
- 2003273206 contributor B9587641.
- 2003273206 created "c2002.".
- 2003273206 date "2002".
- 2003273206 date "c2002.".
- 2003273206 dateCopyrighted "c2002.".
- 2003273206 description "Includes bibliographical references and author index.".
- 2003273206 extent "< 1 > v. :".
- 2003273206 identifier "0819442909".
- 2003273206 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 4562.".
- 2003273206 isPartOf "SPIE proceedings series ; v. 4562".
- 2003273206 issued "2002".
- 2003273206 issued "c2002.".
- 2003273206 language "eng".
- 2003273206 publisher "Bellingham, Wash. : SPIE,".
- 2003273206 subject "Integrated circuits Masks Congresses.".
- 2003273206 subject "Microlithography Congresses.".
- 2003273206 subject "TK7874 .S9435 2002b".
- 2003273206 title "21st Annual BACUS Symposium on Photomask Technology : 3-5 October 2001, Monterey, [California] USA / Giang T. Dao, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.".
- 2003273206 title "BACUS Symposium on Photomask Technology".
- 2003273206 title "Photomask technology".
- 2003273206 title "Symposium on Photomask Technology and Management".
- 2003273206 type "text".