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- 2004058503 contributor B9863084.
- 2004058503 contributor B9863085.
- 2004058503 created "c2005.".
- 2004058503 date "2005".
- 2004058503 date "c2005.".
- 2004058503 dateCopyrighted "c2005.".
- 2004058503 description "Includes bibliographical references (p. 735-748) and index.".
- 2004058503 extent "xxxv, 757 p. :".
- 2004058503 identifier "0471720011 (hardcover)".
- 2004058503 identifier 2004058503-b.html.
- 2004058503 identifier 2004058503-d.html.
- 2004058503 identifier 2004058503-t.html.
- 2004058503 issued "2005".
- 2004058503 issued "c2005.".
- 2004058503 language "eng".
- 2004058503 publisher "Hoboken, N.J. : Wiley-Interscience,".
- 2004058503 subject "530.4/4 22".
- 2004058503 subject "Plasma chemistry Industrial applications.".
- 2004058503 subject "Plasma dynamics.".
- 2004058503 subject "Plasma etching.".
- 2004058503 subject "QC718.5.D9 L54 2005".
- 2004058503 subject "Thin films Surfaces.".
- 2004058503 title "Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg.".
- 2004058503 type "text".