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- 2004101827 contributor B9874361.
- 2004101827 contributor B9874362.
- 2004101827 contributor B9874363.
- 2004101827 created "c2004.".
- 2004101827 date "2004".
- 2004101827 date "c2004.".
- 2004101827 dateCopyrighted "c2004.".
- 2004101827 description "Includes bibliographical references and indexes.".
- 2004101827 extent "xi, 436 p. :".
- 2004101827 identifier "156677411X".
- 2004101827 isPartOf "Proceedings (Electrochemical Society) ; v. 2003-26.".
- 2004101827 isPartOf "Proceedings ; v. 2003-26".
- 2004101827 issued "2004".
- 2004101827 issued "c2004.".
- 2004101827 language "eng".
- 2004101827 publisher "Pennington, N.J. : Electrochemical Society,".
- 2004101827 subject "621.3815/2 22".
- 2004101827 subject "Semiconductor wafers Cleaning Congresses.".
- 2004101827 subject "TK7871.85 .C555 2003".
- 2004101827 title "Cleaning technology in semiconductor device manufacturing VIII : proceedings of the International Symposium / editors, J. Ruzyllo ... [et al.] ; sponsoring Divisions: Electronics, Dielectric Science and Technology.".
- 2004101827 type "text".