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- 2004266489 contributor B9889101.
- 2004266489 contributor B9889102.
- 2004266489 created "c2003.".
- 2004266489 date "2003".
- 2004266489 date "c2003.".
- 2004266489 dateCopyrighted "c2003.".
- 2004266489 description "Includes bibliographical references and author index.".
- 2004266489 extent "2 v. (xviii, 1142 p.) :".
- 2004266489 identifier "0819448427".
- 2004266489 isPartOf "Proceedings of SPIE ; v. 5037".
- 2004266489 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 5037.".
- 2004266489 issued "2003".
- 2004266489 issued "c2003.".
- 2004266489 language "eng".
- 2004266489 publisher "Bellingham, Wash. : SPIE,".
- 2004266489 subject "621.3815/31 22".
- 2004266489 subject "Lithography, Electron beam Congresses.".
- 2004266489 subject "Masks (Electronics) Congresses.".
- 2004266489 subject "Microlithography Industrial applications Congresses.".
- 2004266489 subject "TK7874 .E5267 2003".
- 2004266489 subject "X-ray lithography Congresses.".
- 2004266489 subject "X-rays Industrial applications Congresses.".
- 2004266489 title "Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.".
- 2004266489 type "text".