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- 2004272211 alternative "Photomask and X-ray mask technology".
- 2004272211 contributor B9895274.
- 2004272211 contributor B9895275.
- 2004272211 contributor B9895276.
- 2004272211 created "c2003.".
- 2004272211 date "2003".
- 2004272211 date "c2003.".
- 2004272211 dateCopyrighted "c2003.".
- 2004272211 description "Includes bibliographical references and author index.".
- 2004272211 extent "xxi, 1066 p. :".
- 2004272211 identifier "0819449962".
- 2004272211 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 5130.".
- 2004272211 isPartOf "SPIE proceedings series ; v. 5130".
- 2004272211 issued "2003".
- 2004272211 issued "c2003.".
- 2004272211 language "eng".
- 2004272211 publisher "Bellingham, Wash. : SPIE,".
- 2004272211 subject "621.3815/31 22".
- 2004272211 subject "Integrated circuits Masks Congresses.".
- 2004272211 subject "Masks (Electronics) Congresses.".
- 2004272211 subject "Microlithography Congresses.".
- 2004272211 subject "Optoelectronic devices Design and construction Congresses.".
- 2004272211 subject "TK7878 .P565 2003".
- 2004272211 subject "X-ray lithography Congresses.".
- 2004272211 title "Photomask and X-ray mask technology".
- 2004272211 title "Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.".
- 2004272211 type "text".