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- 2004272510 alternative "Photomask and X-ray mask technology".
- 2004272510 contributor B9895692.
- 2004272510 contributor B9895693.
- 2004272510 contributor B9895694.
- 2004272510 created "c2001.".
- 2004272510 date "2002".
- 2004272510 date "c2001.".
- 2004272510 dateCopyrighted "c2001.".
- 2004272510 description "Includes bibliographical references and author index.".
- 2004272510 extent "xxx, 918 p. :".
- 2004272510 identifier "0819445177".
- 2004272510 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 4754.".
- 2004272510 isPartOf "SPIE proceedings series ; v. 4754".
- 2004272510 issued "2002".
- 2004272510 issued "c2001.".
- 2004272510 language "eng".
- 2004272510 publisher "Bellingham, Wash. : SPIE,".
- 2004272510 subject "621.3815/31 22".
- 2004272510 subject "Integrated circuits Masks Congresses.".
- 2004272510 subject "Masks (Electronics) Congresses.".
- 2004272510 subject "Microlithography Congresses.".
- 2004272510 subject "Optoelectronic devices Design and construction Congresses.".
- 2004272510 subject "TK7878 .P565 2002".
- 2004272510 subject "X-ray lithography Congresses.".
- 2004272510 title "Photomask and X-ray mask technology".
- 2004272510 title "Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.".
- 2004272510 type "text".