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- 2004303191 contributor B9912881.
- 2004303191 contributor B9912882.
- 2004303191 created "c2004.".
- 2004303191 date "2004".
- 2004303191 date "c2004.".
- 2004303191 dateCopyrighted "c2004.".
- 2004303191 description "Includes bibliographical references and index.".
- 2004303191 extent "2 v. (xxxviii, 1288 p.) :".
- 2004303191 identifier "0819452890".
- 2004303191 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 5376.".
- 2004303191 isPartOf "SPIE proceedings series, 0277-786X ; v. 5376".
- 2004303191 issued "2004".
- 2004303191 issued "c2004.".
- 2004303191 language "eng".
- 2004303191 publisher "Bellingham, Wash., USA : SPIE,".
- 2004303191 subject "Microlithography Congresses.".
- 2004303191 subject "Photoresists Congresses.".
- 2004303191 subject "TK7874 .A3379 2004".
- 2004303191 title "Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA / John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.".
- 2004303191 type "text".