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- 2004304493 contributor B9914468.
- 2004304493 contributor B9914469.
- 2004304493 created "c2004.".
- 2004304493 date "2004".
- 2004304493 date "c2004.".
- 2004304493 dateCopyrighted "c2004.".
- 2004304493 description "Includes bibliographical references and author index.".
- 2004304493 extent "2 v. (xl, 1398 p.) :".
- 2004304493 identifier "0819452882".
- 2004304493 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 5375.".
- 2004304493 isPartOf "SPIE proceedings series ; v. 5375".
- 2004304493 issued "2004".
- 2004304493 issued "c2004.".
- 2004304493 language "eng".
- 2004304493 publisher "Bellingham, Wash. : SPIE,".
- 2004304493 subject "Integrated circuits Inspection Congresses.".
- 2004304493 subject "Integrated circuits Measurement Congresses.".
- 2004304493 subject "Microlithography Congresses.".
- 2004304493 subject "Process control Congresses.".
- 2004304493 subject "TK7874 .M3765 2004".
- 2004304493 title "Metrology, inspection, and process control for microlithography XVIII : 23-26 February, 2004, Santa Clara, California, USA / Richard M. Silver, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.".
- 2004304493 type "text".