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- 2004304504 alternative "Emerging lithographic technologies 8".
- 2004304504 alternative "Emerging lithographic technologies eight".
- 2004304504 contributor B9914485.
- 2004304504 contributor B9914486.
- 2004304504 created "c2004.".
- 2004304504 date "2004".
- 2004304504 date "c2004.".
- 2004304504 dateCopyrighted "c2004.".
- 2004304504 description "Includes bibliographical references and index.".
- 2004304504 extent "2 v. (xxxviii, 1110 p.) :".
- 2004304504 identifier "0819452874".
- 2004304504 isPartOf "Proceedings of SPIE, 0277-786X ; v. 5374".
- 2004304504 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 5374.".
- 2004304504 issued "2004".
- 2004304504 issued "c2004.".
- 2004304504 language "eng".
- 2004304504 publisher "Bellingham, Wash., USA : SPIE,".
- 2004304504 subject "Lithography, Electron beam Congresses.".
- 2004304504 subject "Masks (Electronics) Congresses.".
- 2004304504 subject "Microlithography Industrial applications Congresses.".
- 2004304504 subject "TK7874 .E5233 2004".
- 2004304504 subject "X-ray lithography Congresses.".
- 2004304504 subject "X-rays Industrial applications Congresses.".
- 2004304504 title "Emerging lithographic technologies 8".
- 2004304504 title "Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA / R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.".
- 2004304504 title "Emerging lithographic technologies eight".
- 2004304504 type "text".