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- 2005025505 contributor B10134674.
- 2005025505 created "c2006.".
- 2005025505 date "2006".
- 2005025505 date "c2006.".
- 2005025505 dateCopyrighted "c2006.".
- 2005025505 description "Includes bibliographical references and index.".
- 2005025505 extent "xxxv, 1057 p. :".
- 2005025505 identifier "0819458457".
- 2005025505 identifier 2005025505.html.
- 2005025505 issued "2006".
- 2005025505 issued "c2006.".
- 2005025505 language "eng".
- 2005025505 publisher "Bellingham, Wash. : SPIE Press,".
- 2005025505 subject "621.36/4 22".
- 2005025505 subject "Extreme ultraviolet lithography.".
- 2005025505 subject "Lithography.".
- 2005025505 subject "Plasma (Ionized gases)".
- 2005025505 subject "QC459 .E98 2006".
- 2005025505 subject "Ultraviolet radiation Industrial applications.".
- 2005025505 title "EUV sources for lithography / [edited by] Vivek Bakshi.".
- 2005025505 type "text".