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- 2005047886 contributor B10158652.
- 2005047886 contributor B10158653.
- 2005047886 created "c2005.".
- 2005047886 date "2005".
- 2005047886 date "c2005.".
- 2005047886 dateCopyrighted "c2005.".
- 2005047886 description "Includes bibliographical references and index.".
- 2005047886 extent "xi, 571 p. :".
- 2005047886 identifier "0071445633 (alk. paper)".
- 2005047886 identifier 2005047886-b.html.
- 2005047886 identifier 2005047886-d.html.
- 2005047886 identifier 2005047886-t.html.
- 2005047886 isPartOf "McGraw-Hill electronic engineering series.".
- 2005047886 isPartOf "McGraw-Hill electronic engineering".
- 2005047886 issued "2005".
- 2005047886 issued "c2005.".
- 2005047886 language "eng".
- 2005047886 publisher "New York : McGraw-Hill,".
- 2005047886 subject "621.3815/31 22".
- 2005047886 subject "Integrated circuits Masks.".
- 2005047886 subject "Masks (Electronics)".
- 2005047886 subject "Microlithography.".
- 2005047886 subject "TK7872.M3 E99 2005".
- 2005047886 title "Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.".
- 2005047886 type "text".