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- 2005278326 alternative "Annual BACUS Symposium on Photomask Technology".
- 2005278326 alternative "BACUS Symposium on Photomask Technology".
- 2005278326 alternative "Photomask technology".
- 2005278326 alternative "Symposium on Photomask Technology and Management.".
- 2005278326 alternative "Symposium on Photomask Technology".
- 2005278326 contributor B10180522.
- 2005278326 contributor B10180523.
- 2005278326 contributor B10180524.
- 2005278326 created "c2004.".
- 2005278326 date "2004".
- 2005278326 date "c2004.".
- 2005278326 dateCopyrighted "c2004.".
- 2005278326 description "Includes bibliographical references and author index.".
- 2005278326 extent "2 v. (xix, 1450 p.) :".
- 2005278326 identifier "081945513X (pbk.)".
- 2005278326 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 5567.".
- 2005278326 isPartOf "SPIE proceedings series, 0277-786X ; v. 5567".
- 2005278326 issued "2004".
- 2005278326 issued "c2004.".
- 2005278326 language "eng".
- 2005278326 publisher "Bellingham, Wash. : SPIE,".
- 2005278326 subject "621.3815/31 22".
- 2005278326 subject "Integrated circuits Masks Congresses.".
- 2005278326 subject "Microlithography Congresses.".
- 2005278326 subject "TK7874 .S9434 2004".
- 2005278326 title "24th Annual BACUS Symposium on Photomask Technology : 14-17 September, 2004, Monterey, California, USA / Wolfgang Staud, J. Tracy Weed, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.".
- 2005278326 title "Annual BACUS Symposium on Photomask Technology".
- 2005278326 title "BACUS Symposium on Photomask Technology".
- 2005278326 title "Photomask technology".
- 2005278326 title "Symposium on Photomask Technology".
- 2005278326 type "text".