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- 2005283178 contributor B10186482.
- 2005283178 contributor B10186483.
- 2005283178 created "c2005.".
- 2005283178 date "2005".
- 2005283178 date "c2005.".
- 2005283178 dateCopyrighted "c2005.".
- 2005283178 description "Includes bibliographical references and author index.".
- 2005283178 extent "3 v. (xiv, 1474 p.) :".
- 2005283178 identifier "0819457329 (pbk.)".
- 2005283178 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 5752.".
- 2005283178 isPartOf "SPIE proceedings series ; v. 5752".
- 2005283178 issued "2005".
- 2005283178 issued "c2005.".
- 2005283178 language "eng".
- 2005283178 publisher "Bellingham, Wash. : SPIE,".
- 2005283178 subject "Integrated circuits Inspection Congresses.".
- 2005283178 subject "Integrated circuits Measurement Congresses.".
- 2005283178 subject "Microlithography Congresses.".
- 2005283178 subject "Process control Congresses.".
- 2005283178 subject "TK7874 .M43766 2005".
- 2005283178 title "Metrology, inspection, and process control for microlithography XIX : 28 February-3 March, 2005, San Jose, California, USA / Richard M. Silver, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH.".
- 2005283178 type "text".