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- 2005284357 alternative "Photomask and X-ray mask technology".
- 2005284357 contributor B10187801.
- 2005284357 contributor B10187802.
- 2005284357 created "c2005.".
- 2005284357 date "2005".
- 2005284357 date "c2005.".
- 2005284357 dateCopyrighted "c2005.".
- 2005284357 description "Includes bibliographical references and author index.".
- 2005284357 extent "2 v. (xli, 1048 p.) :".
- 2005284357 identifier "0819458538 (pbk.)".
- 2005284357 isPartOf "Proceedings of SPIE ; v. 5853".
- 2005284357 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 5853.".
- 2005284357 issued "2005".
- 2005284357 issued "c2005.".
- 2005284357 language "eng".
- 2005284357 publisher "Bellingham, Wash. : SPIE,".
- 2005284357 subject "621.3815/31 22".
- 2005284357 subject "Integrated circuits Masks Congresses.".
- 2005284357 subject "Masks (Electronics) Congresses.".
- 2005284357 subject "Microlithography Congresses.".
- 2005284357 subject "Optoelectronic devices Design and construction Congresses.".
- 2005284357 subject "TK7878 .P557 2005".
- 2005284357 subject "X-ray lithography Congresses.".
- 2005284357 title "Photomask and X-ray mask technology".
- 2005284357 title "Photomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan / Masanori Komuro, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering.".
- 2005284357 type "text".