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- 2005299112 alternative "Microlithography technologies".
- 2005299112 contributor B10193361.
- 2005299112 contributor B10193362.
- 2005299112 created "c2005.".
- 2005299112 date "2005".
- 2005299112 date "c2005.".
- 2005299112 dateCopyrighted "c2005.".
- 2005299112 description "Includes bibliographical references and author index.".
- 2005299112 extent "xi, 380 p. :".
- 2005299112 identifier "0819456004".
- 2005299112 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 5645.".
- 2005299112 isPartOf "SPIE proceedings series, 0277-786X ; v. 5645".
- 2005299112 issued "2005".
- 2005299112 issued "c2005.".
- 2005299112 language "eng".
- 2005299112 publisher "Bellingham, Wash. : SPIE,".
- 2005299112 subject "621.3815/31 22".
- 2005299112 subject "Integrated circuits Masks Congresses.".
- 2005299112 subject "Manufacturing processes Congresses.".
- 2005299112 subject "Microlithography Congresses.".
- 2005299112 subject "TK7872.M3 A38 2005".
- 2005299112 subject "X-ray lithography Congresses.".
- 2005299112 title "Advanced microlithography technologies : 8-10 November, 2004, Beijing, China / Yangyuan Wang, Jun-en Yao, Christopher J. Progler, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, COS--Chinese Optical Society ; cooperating organizations, Australian Optical Society ... [et al.] ; supporting organizations, National Natural Science Foundation of China ... [et al.].".
- 2005299112 title "Microlithography technologies".
- 2005299112 type "text".