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- 2006030740 contributor B10442553.
- 2006030740 created "c2007.".
- 2006030740 date "2007".
- 2006030740 date "c2007.".
- 2006030740 dateCopyrighted "c2007.".
- 2006030740 description "Includes bibliographical references and index.".
- 2006030740 description "Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition / A. Grill -- Spin-on dielectric materials / Geraud Dubois, Robert D. Miller, Willi Volksen -- Positron annihilation spectroscopy / David W. Gidley, Hua-Gen Peng, Richard Vallery -- Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation / Christopher L. Soles ... [et al.] -- Ellipsometric porosimetry / Mikhail R. Baklanov -- Mechanical and transport properties of low-k dielectrics / J. L. Plawsky ... [et al.] -- Integration of low-k dielectric films in damascene processes / R. J. O. M. Hoofman ... [et al.] -- ONO structures and oxynitrides in modern microelectronics : material science, characterization and application / Yakov Roizin, Vladimir Gritsenko -- Material engineering of high-k gate dielectrics / Akira Toriumi, Koji Kita -- Physical characterization of ultra-thin high-k dielectric / T. Conard, H. Bender, W. Vandervorst -- Electrical characterization of advanced gate dielectrics / Robin Degraeve ... [et al.] -- Integration issues of high-k gate dielectrics / Yasuo Nara -- Anisotropic conductive film (ACF) for advanced microelectronic interconnects / Yi Li, C. P. Wong.".
- 2006030740 extent "xxii, 486 p. :".
- 2006030740 identifier "0470013605 (hbk.)".
- 2006030740 identifier "9780470013601 (hbk.)".
- 2006030740 identifier 2006030740-b.html.
- 2006030740 identifier 2006030740-d.html.
- 2006030740 identifier 2006030740.html.
- 2006030740 isPartOf "Wiley series in materials for electronic and optoelectronic applications".
- 2006030740 issued "2007".
- 2006030740 issued "c2007.".
- 2006030740 language "eng".
- 2006030740 publisher "Chichester, England ; Hoboken, NJ : John Wiley & Sons,".
- 2006030740 subject "621.381 22".
- 2006030740 subject "Dielectric films.".
- 2006030740 subject "Microelectronics Materials.".
- 2006030740 subject "TK7871.15.F5 D54 2007".
- 2006030740 tableOfContents "Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition / A. Grill -- Spin-on dielectric materials / Geraud Dubois, Robert D. Miller, Willi Volksen -- Positron annihilation spectroscopy / David W. Gidley, Hua-Gen Peng, Richard Vallery -- Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation / Christopher L. Soles ... [et al.] -- Ellipsometric porosimetry / Mikhail R. Baklanov -- Mechanical and transport properties of low-k dielectrics / J. L. Plawsky ... [et al.] -- Integration of low-k dielectric films in damascene processes / R. J. O. M. Hoofman ... [et al.] -- ONO structures and oxynitrides in modern microelectronics : material science, characterization and application / Yakov Roizin, Vladimir Gritsenko -- Material engineering of high-k gate dielectrics / Akira Toriumi, Koji Kita -- Physical characterization of ultra-thin high-k dielectric / T. Conard, H. Bender, W. Vandervorst -- Electrical characterization of advanced gate dielectrics / Robin Degraeve ... [et al.] -- Integration issues of high-k gate dielectrics / Yasuo Nara -- Anisotropic conductive film (ACF) for advanced microelectronic interconnects / Yi Li, C. P. Wong.".
- 2006030740 title "Dielectric films for advanced microelectronics / edited by Mikhail Baklanov, Martin Green, and Karen Maex.".
- 2006030740 type "text".