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- 2006271122 contributor B10472519.
- 2006271122 contributor B10472520.
- 2006271122 created "c2005.".
- 2006271122 date "2005".
- 2006271122 date "c2005.".
- 2006271122 dateCopyrighted "c2005.".
- 2006271122 description "Includes bibliographical references and author index.".
- 2006271122 extent "2 v. (xviii, 1244 p.) :".
- 2006271122 identifier "0819457310 (pbk.)".
- 2006271122 isPartOf "Proceedings of SPIE, 0277-786X ; v. 5751".
- 2006271122 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 5751.".
- 2006271122 issued "2005".
- 2006271122 issued "c2005.".
- 2006271122 language "eng".
- 2006271122 publisher "Bellingham, Wash. : SPIE,".
- 2006271122 subject "621.3815/31 22".
- 2006271122 subject "Lithography, Electron beam Congresses.".
- 2006271122 subject "Masks (Electronics) Congresses.".
- 2006271122 subject "Microlithography Industrial applications Congresses.".
- 2006271122 subject "TK7874 .E5269 2005".
- 2006271122 subject "X-ray lithography Congresses.".
- 2006271122 subject "X-rays Industrial applications Congresses.".
- 2006271122 title "Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA / R. Scott Mackay, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH.".
- 2006271122 type "text".