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- 2006272389 contributor B10474074.
- 2006272389 contributor B10474075.
- 2006272389 created "c2005.".
- 2006272389 date "2005".
- 2006272389 date "c2005.".
- 2006272389 dateCopyrighted "c2005.".
- 2006272389 description "Includes bibliographical references and author index.".
- 2006272389 extent "xxxv, 438 p. :".
- 2006272389 identifier "0819457361 (pbk.)".
- 2006272389 isPartOf "Proceedings of SPIE, 0277-786X ; v. 5756".
- 2006272389 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 5756.".
- 2006272389 issued "2005".
- 2006272389 issued "c2005.".
- 2006272389 language "eng".
- 2006272389 publisher "Bellingham, Wash. : SPIE,".
- 2006272389 subject "621.381 22".
- 2006272389 subject "Integrated circuits Defects Analysis Congresses.".
- 2006272389 subject "Integrated circuits Design and construction Congresses.".
- 2006272389 subject "Microelectronics industry Quality control Congresses.".
- 2006272389 subject "Quality control Congresses.".
- 2006272389 subject "Semiconductor wafers Defects Analysis Congresses.".
- 2006272389 subject "Semiconductors Design and construction Congresses.".
- 2006272389 subject "TK7874 .D47462 2005".
- 2006272389 title "Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA / Lars W. Liebmann, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH.".
- 2006272389 type "text".