Matches in Library of Congress for { <http://lccn.loc.gov/2006295072> ?p ?o. }
Showing items 1 to 21 of
21
with 100 items per page.
- 2006295072 contributor B10493644.
- 2006295072 contributor B10493645.
- 2006295072 created "c2005.".
- 2006295072 date "2005".
- 2006295072 date "c2005.".
- 2006295072 dateCopyrighted "c2005.".
- 2006295072 description "Includes bibliographical references and author index.".
- 2006295072 extent "2 v. (xliii, 1216 p.) :".
- 2006295072 identifier "0819457337 (2 v. set)".
- 2006295072 isPartOf "Proceedings of SPIE ; v. 5753".
- 2006295072 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 5753.".
- 2006295072 issued "2005".
- 2006295072 issued "c2005.".
- 2006295072 language "eng".
- 2006295072 publisher "Bellingham, Wash. : SPIE,".
- 2006295072 subject "621.3815/31 22".
- 2006295072 subject "Microlithography Congresses.".
- 2006295072 subject "Photoresists Congresses.".
- 2006295072 subject "TK7874 .A33793 2005".
- 2006295072 title "Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA / John L. Sturtevant, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering, AZ Electronic Materials (USA), Rohm and Haas Electronic Materials (USA) ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering..".
- 2006295072 type "text".