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- 2007271488 alternative "Annual BACUS Symposium on Photomask Technology".
- 2007271488 alternative "BACUS Symposium on Photomask Technology".
- 2007271488 alternative "Photomask technology".
- 2007271488 alternative "Symposium on Photomask Technology and Management.".
- 2007271488 alternative "Symposium on Photomask Technology".
- 2007271488 contributor B10815743.
- 2007271488 contributor B10815744.
- 2007271488 contributor B10815745.
- 2007271488 created "c2006.".
- 2007271488 date "2005".
- 2007271488 date "c2006.".
- 2007271488 dateCopyrighted "c2006.".
- 2007271488 description "Includes bibliographical references and author index.".
- 2007271488 extent "2 v. (various pagings) :".
- 2007271488 identifier "0819464449 (pbk.)".
- 2007271488 identifier "9780819464446".
- 2007271488 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 6349.".
- 2007271488 isPartOf "SPIE proceedings series ; v. 6349".
- 2007271488 issued "2005".
- 2007271488 issued "c2006.".
- 2007271488 language "eng".
- 2007271488 publisher "Bellingham, Wash. : SPIE,".
- 2007271488 subject "621.3815/31 22".
- 2007271488 subject "Integrated circuits Masks Congresses.".
- 2007271488 subject "Microlithography Congresses.".
- 2007271488 subject "TK7874 .S9434 2006".
- 2007271488 title "Annual BACUS Symposium on Photomask Technology".
- 2007271488 title "BACUS Symposium on Photomask Technology".
- 2007271488 title "Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA / Patrick M. Martin, Robert J. Naber, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.".
- 2007271488 title "Photomask technology".
- 2007271488 title "Symposium on Photomask Technology".
- 2007271488 type "text".