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- 2007271836 alternative "Photomask and X-ray mask technology".
- 2007271836 contributor B10816179.
- 2007271836 contributor B10816180.
- 2007271836 created "c2006.".
- 2007271836 date "2006".
- 2007271836 date "c2006.".
- 2007271836 dateCopyrighted "c2006.".
- 2007271836 description "Includes bibliographical references and author index.".
- 2007271836 extent "2 v. :".
- 2007271836 identifier "0819463582".
- 2007271836 isPartOf "Proceedings of SPIE, 0277-786X ; 6283".
- 2007271836 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 6283.".
- 2007271836 issued "2006".
- 2007271836 issued "c2006.".
- 2007271836 language "eng".
- 2007271836 publisher "Bellingham, Wash. : SPIE,".
- 2007271836 subject "621.3815/31 22".
- 2007271836 subject "Integrated circuits Masks Congresses.".
- 2007271836 subject "Masks (Electronics) Congresses.".
- 2007271836 subject "Microlithography Congresses.".
- 2007271836 subject "Optoelectronic devices Design and construction Congresses.".
- 2007271836 subject "TK7878 .P557 2006".
- 2007271836 subject "X-ray lithography Congresses.".
- 2007271836 title "Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan / Morihisa Hoga, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan).".
- 2007271836 type "text".