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- 2007278735 contributor B10824705.
- 2007278735 contributor B10824706.
- 2007278735 created "c2006.".
- 2007278735 date "2006".
- 2007278735 date "c2006.".
- 2007278735 dateCopyrighted "c2006.".
- 2007278735 description "Includes bibliographical references and author index.".
- 2007278735 extent "2 v. :".
- 2007278735 identifier "0819461954".
- 2007278735 identifier "9780819461957".
- 2007278735 isPartOf "Proceedings of SPIE ; v. 6152".
- 2007278735 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 6152.".
- 2007278735 issued "2006".
- 2007278735 issued "c2006.".
- 2007278735 language "eng".
- 2007278735 publisher "Bellingham, Wash. : SPIE,".
- 2007278735 subject "621.3815/3 22".
- 2007278735 subject "Integrated circuits Inspection Congresses.".
- 2007278735 subject "Integrated circuits Measurement Congresses.".
- 2007278735 subject "Microlithography Congresses.".
- 2007278735 subject "Process control Congresses.".
- 2007278735 subject "TK7874 .M43766 2006".
- 2007278735 title "Metrology, inspection, and process control for microlithography XX : 20-23 February, 2006, San Jose, California, USA / Chas N. Archie, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc.".
- 2007278735 type "text".