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- 2007280592 alternative "Optical microlithography 19".
- 2007280592 alternative "Optical microlithography nineteen".
- 2007280592 contributor B10827084.
- 2007280592 contributor B10827085.
- 2007280592 created "c2006.".
- 2007280592 date "2006".
- 2007280592 date "c2006.".
- 2007280592 dateCopyrighted "c2006.".
- 2007280592 description "Includes bibliographical references and author index.".
- 2007280592 extent "3 v. :".
- 2007280592 identifier "0819461970 (pbk.)".
- 2007280592 identifier "9780819461971 (pbk.)".
- 2007280592 isPartOf "Proceedings of SPIE ; v. 6154".
- 2007280592 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 6154.".
- 2007280592 issued "2006".
- 2007280592 issued "c2006.".
- 2007280592 language "eng".
- 2007280592 publisher "Bellingham, Wash. : SPIE,".
- 2007280592 subject "621.3815/31 22".
- 2007280592 subject "Integrated circuits Masks Congresses.".
- 2007280592 subject "Manufacturing processes Congresses.".
- 2007280592 subject "Microlithography Congresses.".
- 2007280592 subject "TK7835 .O664 2006".
- 2007280592 subject "X-ray lithography Congresses.".
- 2007280592 title "Optical microlithography 19".
- 2007280592 title "Optical microlithography XIX : 21-24 February, 2006, San Jose, California, USA / Donis G. Flagello, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc. (USA).".
- 2007280592 title "Optical microlithography nineteen".
- 2007280592 type "text".