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- 2008018045 contributor B11092541.
- 2008018045 created "c2009.".
- 2008018045 date "2009".
- 2008018045 date "c2009.".
- 2008018045 dateCopyrighted "c2009.".
- 2008018045 description "Includes bibliographical references and index.".
- 2008018045 extent "xxvii, 673 p. :".
- 2008018045 identifier "0470471557 (Wiley)".
- 2008018045 identifier "0819469645 (SPIE)".
- 2008018045 identifier "9780470471555 (Wiley)".
- 2008018045 identifier "9780819469649 (SPIE)".
- 2008018045 identifier 2008018045.html.
- 2008018045 issued "2009".
- 2008018045 issued "c2009.".
- 2008018045 language "eng".
- 2008018045 publisher "Bellingham, Wash. : SPIE Press ; Hoboken, NJ : John Wiley,".
- 2008018045 subject "621.3815 22".
- 2008018045 subject "Optical coatings.".
- 2008018045 subject "Photolithography.".
- 2008018045 subject "QC459 .E98 2009".
- 2008018045 subject "Ultraviolet radiation Industrial applications.".
- 2008018045 title "EUV lithography / Vivek Bakshi, editor.".
- 2008018045 type "text".