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- 2008050743 alternative "Immersion lithography".
- 2008050743 contributor B11132303.
- 2008050743 contributor B11132304.
- 2008050743 created "c2009.".
- 2008050743 date "2009".
- 2008050743 date "c2009.".
- 2008050743 dateCopyrighted "c2009.".
- 2008050743 description "Includes bibliographical references and index.".
- 2008050743 extent "xix, 315 p. :".
- 2008050743 identifier "0819475572 (alk. paper)".
- 2008050743 identifier "9780819475572 (alk. paper)".
- 2008050743 issued "2009".
- 2008050743 issued "c2009.".
- 2008050743 language "eng".
- 2008050743 publisher "Bellingham, Wash. : SPIE,".
- 2008050743 subject "621.3815/31 22".
- 2008050743 subject "Immersion lithography.".
- 2008050743 subject "Integrated circuits Design and construction.".
- 2008050743 subject "Semiconductors Etching.".
- 2008050743 subject "TK7872.M3 W45 2009".
- 2008050743 title "Advanced processes for 193-nm immersion lithography / Yayi Wei, Robert L. Brainard.".
- 2008050743 title "Immersion lithography".
- 2008050743 type "text".