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- 2008900091 contributor B11373939.
- 2008900091 created "c2008.".
- 2008900091 date "2008".
- 2008900091 date "c2008.".
- 2008900091 dateCopyrighted "c2008.".
- 2008900091 description "Includes bibliographical references and index.".
- 2008900091 extent "xv, 239 p. :".
- 2008900091 identifier "9780981466347".
- 2008900091 issued "2008".
- 2008900091 issued "c2008.".
- 2008900091 language "eng".
- 2008900091 publisher "Ivoryton, Conn. : Ivoryton Press,".
- 2008900091 subject "Chemical vapor deposition.".
- 2008900091 subject "Epitaxy.".
- 2008900091 subject "Microelectronics.".
- 2008900091 subject "Nanotechnology.".
- 2008900091 subject "TS695 .S5385 2008".
- 2008900091 title "Atomic layer deposition for nanotechnology : an enabling process for nanotechnology fabrication / by Arthur Sherman.".
- 2008900091 type "text".