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- 2009002187 contributor B11395014.
- 2009002187 created "c2009.".
- 2009002187 date "2009".
- 2009002187 date "c2009.".
- 2009002187 dateCopyrighted "c2009.".
- 2009002187 description "Includes bibliographical references and index.".
- 2009002187 extent "xiv, 465 p. :".
- 2009002187 identifier "0071549188 (alk. paper)".
- 2009002187 identifier "9780071549189 (alk. paper)".
- 2009002187 issued "2009".
- 2009002187 issued "c2009.".
- 2009002187 language "eng".
- 2009002187 publisher "New York : McGraw-Hill,".
- 2009002187 subject "621.3815/31 22".
- 2009002187 subject "Extreme ultraviolet lithography.".
- 2009002187 subject "Integrated circuits Design and construction.".
- 2009002187 subject "Integrated circuits Masks.".
- 2009002187 subject "TK7872.M3 E987 2009".
- 2009002187 title "Extreme ultraviolet lithography / [edited by] Banqiu Wu, Ajay Kumar.".
- 2009002187 type "text".