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- 2009049250 contributor B11452170.
- 2009049250 contributor B11452171.
- 2009049250 created "c2010.".
- 2009049250 date "2010".
- 2009049250 date "c2010.".
- 2009049250 dateCopyrighted "c2010.".
- 2009049250 description "Includes bibliographical references (p. 217-222) and index.".
- 2009049250 extent "xv, 226 p. :".
- 2009049250 identifier "047059697X (cloth)".
- 2009049250 identifier "9780470596975 (cloth)".
- 2009049250 isPartOf "Wiley series in pure and applied optics".
- 2009049250 isPartOf "Wiley series in pure and applied optics.".
- 2009049250 issued "2010".
- 2009049250 issued "c2010.".
- 2009049250 language "eng".
- 2009049250 publisher "Hoboken, N.J. : Wiley,".
- 2009049250 subject "621.3815/31 22".
- 2009049250 subject "Integrated circuits Design and construction Mathematics.".
- 2009049250 subject "Microlithography Mathematics.".
- 2009049250 subject "Photolithography Mathematics.".
- 2009049250 subject "Resolution (Optics)".
- 2009049250 subject "Semiconductors Etching Mathematics.".
- 2009049250 subject "TK7872.M3 M3 2010".
- 2009049250 title "Computational lithography / Xu Ma and Gonzalo R. Arce.".
- 2009049250 type "text".