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- 2009921817 contributor B11721656.
- 2009921817 created "c2009.".
- 2009921817 date "2009".
- 2009921817 date "c2009.".
- 2009921817 dateCopyrighted "c2009.".
- 2009921817 description "Includes bibliographical references (p. 669-703) and index.".
- 2009921817 extent "xxiv, 732 p. :".
- 2009921817 identifier "9783540858485 (alk. paper)".
- 2009921817 identifier "9783540858492 (ebk.)".
- 2009921817 issued "2009".
- 2009921817 issued "c2009.".
- 2009921817 language "eng".
- 2009921817 publisher "Berlin : Springer,".
- 2009921817 subject "621.044 22".
- 2009921817 subject "Hochfrequenzentladung. swd".
- 2009921817 subject "Ionenstrahlbearbeitung. swd".
- 2009921817 subject "Ionenstrahlbearbeitung.".
- 2009921817 subject "Niederdruckplasma Hochfrequenzentladung.".
- 2009921817 subject "Niederdruckplasma. swd".
- 2009921817 subject "PECVD-Verfahren Sputtern.".
- 2009921817 subject "PECVD-Verfahren. swd".
- 2009921817 subject "Plasma (Ionized gases) Industrial applications.".
- 2009921817 subject "Plasma engineering.".
- 2009921817 subject "Plasma etching.".
- 2009921817 subject "Plasmaätzen. swd".
- 2009921817 subject "Plasmaätzen.".
- 2009921817 subject "Plasmadiagnostik. swd".
- 2009921817 subject "Plasmadiagnostik.".
- 2009921817 subject "Sputtern. swd".
- 2009921817 subject "TA2020 .F73 2009".
- 2009921817 title "Low pressure plasmas and microstructuring technology / Gerhard Franz.".
- 2009921817 type "text".