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- 2009940607 contributor B11734011.
- 2009940607 contributor B11734012.
- 2009940607 created "c2010.".
- 2009940607 date "2009".
- 2009940607 date "c2010.".
- 2009940607 dateCopyrighted "c2010.".
- 2009940607 extent "xiv, 342 p. :".
- 2009940607 identifier "1848828934 (hbk.)".
- 2009940607 identifier "1848828942 (e-ISBN)".
- 2009940607 identifier "9781848828933 (hbk.)".
- 2009940607 identifier "9781848828940 (e-ISBN)".
- 2009940607 isPartOf "Engineering materials and processes, 1619-0181".
- 2009940607 isPartOf "Engineering materials and processes.".
- 2009940607 issued "2009".
- 2009940607 issued "c2010.".
- 2009940607 language "eng".
- 2009940607 publisher "London ; New York : Springer,".
- 2009940607 subject "Chemical vapor deposition.".
- 2009940607 subject "Coating processes.".
- 2009940607 subject "TS695 .Y56 2010".
- 2009940607 title "Chemical vapour deposition : an integrated engineering design for advanced materials / Yongdong Xu, Xiu-Tian Yan.".
- 2009940607 type "text".