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- 2010038653 contributor B11783032.
- 2010038653 contributor B11783033.
- 2010038653 created "c2011.".
- 2010038653 date "2011".
- 2010038653 date "c2011.".
- 2010038653 dateCopyrighted "c2011.".
- 2010038653 description "Includes bibliographical references (p. [61]-68) and index.".
- 2010038653 description "Principle and fundamental process for NIL -- Variations of NIL processes -- NIL materials -- Prospects and challenges in NIL.".
- 2010038653 extent "viii, 73 p. :".
- 2010038653 identifier "9781611225013 (softcover)".
- 2010038653 issued "2011".
- 2010038653 issued "c2011.".
- 2010038653 language "eng".
- 2010038653 publisher "New York : Nova Science Publishers, Inc.,".
- 2010038653 subject "621.3815/31 22".
- 2010038653 subject "Microlithography.".
- 2010038653 subject "Nanoelectronics.".
- 2010038653 subject "Nanolithography.".
- 2010038653 subject "Nanostructures.".
- 2010038653 subject "TK7874.84 .L36 2011".
- 2010038653 tableOfContents "Principle and fundamental process for NIL -- Variations of NIL processes -- NIL materials -- Prospects and challenges in NIL.".
- 2010038653 title "Nanoimprint lithography : principles, processes and materials / Hongbo Lan, Yucheng Ding and Hongzhong Liu.".
- 2010038653 type "text".