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- 2010287918 alternative "Emerging lithographic technologies 12".
- 2010287918 alternative "Emerging lithographic technologies twelve".
- 2010287918 contributor B11815651.
- 2010287918 contributor B11815652.
- 2010287918 created "c2008.".
- 2010287918 date "2008".
- 2010287918 date "c2008.".
- 2010287918 dateCopyrighted "c2008.".
- 2010287918 description "Includes bibliographical references and author index.".
- 2010287918 extent "2 v. :".
- 2010287918 identifier "0819471062".
- 2010287918 identifier "9780819471062".
- 2010287918 isPartOf "Proceedings of SPIE, 0277-786X ; v. 6921".
- 2010287918 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 6921.".
- 2010287918 issued "2008".
- 2010287918 issued "c2008.".
- 2010287918 language "eng".
- 2010287918 publisher "Bellingham, Wash. : SPIE,".
- 2010287918 subject "621.3815/31 23".
- 2010287918 subject "Lithography, Electron beam Congresses.".
- 2010287918 subject "Masks (Electronics) Congresses.".
- 2010287918 subject "Microlithography Industrial applications Congresses.".
- 2010287918 subject "TK7874 .E57 2008".
- 2010287918 subject "X-ray lithography Congresses.".
- 2010287918 subject "X-rays Industrial applications Congresses.".
- 2010287918 title "Emerging lithographic technologies 12".
- 2010287918 title "Emerging lithographic technologies XII : 26-28 February 2008, San Jose, California, USA / Frank M. Schellenberg, editor ; sponsored by SPIE ; cooperating organization, SEMATECH (USA).".
- 2010287918 title "Emerging lithographic technologies twelve".
- 2010287918 type "text".