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- 2010287933 contributor B11815690.
- 2010287933 contributor B11815691.
- 2010287933 created "c2008.".
- 2010287933 date "2008".
- 2010287933 date "c2008.".
- 2010287933 dateCopyrighted "c2008.".
- 2010287933 description "Includes bibliographical references and index.".
- 2010287933 extent "2 v. :".
- 2010287933 identifier "9780819473813".
- 2010287933 isPartOf "Proceedings of SPIE, 0277-786X ; v. 7140".
- 2010287933 issued "2008".
- 2010287933 issued "c2008.".
- 2010287933 language "eng".
- 2010287933 publisher "Bellingham, Wash. : SPIE,".
- 2010287933 subject "621.3815/31 23".
- 2010287933 subject "Lithography, Electron beam Congresses.".
- 2010287933 subject "Masks (Electronics) Congresses.".
- 2010287933 subject "Microlithography Industrial applications Congresses.".
- 2010287933 subject "TK7874 .L55 2008".
- 2010287933 subject "X-ray lithography Congresses.".
- 2010287933 subject "X-rays Industrial applications Congresses.".
- 2010287933 title "Lithography Asia 2008 : 4-6 November 2008, Taipei, Taiwan / Alek C. Chen, Burn Lin, Anthony Yen, editors ; sponsored and published by SPIE ; cooperating organization, TSIA--Taiwan Semiconducrtor Industry Association.".
- 2010287933 type "text".