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- 2010455643 contributor B11961290.
- 2010455643 contributor B11961291.
- 2010455643 created "2009.".
- 2010455643 date "2009".
- 2010455643 date "2009.".
- 2010455643 dateCopyrighted "2009.".
- 2010455643 description "Includes bibliographical references and index.".
- 2010455643 extent "2 v. :".
- 2010455643 identifier "0819475254".
- 2010455643 identifier "9780819475251".
- 2010455643 isPartOf "Proceedings of SPIE, 0277-786X ; v. 7272".
- 2010455643 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 7272.".
- 2010455643 issued "2009".
- 2010455643 issued "2009.".
- 2010455643 language "eng".
- 2010455643 publisher "Bellingham, Wash. : SPIE,".
- 2010455643 subject "621.3815/48 22".
- 2010455643 subject "Integrated circuits Inspection Congresses.".
- 2010455643 subject "Integrated circuits Measurement Congresses.".
- 2010455643 subject "Microlithography Congresses.".
- 2010455643 subject "Process control Congresses.".
- 2010455643 subject "TK7874 .M43767 2009".
- 2010455643 title "Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States / John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States).".
- 2010455643 type "text".