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- 2010455661 alternative "Emerging lithographic technologies.".
- 2010455661 contributor B11961328.
- 2010455661 contributor B11961329.
- 2010455661 created "c2009-".
- 2010455661 date "2009".
- 2010455661 date "c2009-".
- 2010455661 dateCopyrighted "c2009-".
- 2010455661 description "Includes bibliographical references and author index.".
- 2010455661 extent "2 v. (various pagings) :".
- 2010455661 identifier "0819475246".
- 2010455661 identifier "9780819475244".
- 2010455661 isPartOf "Proceedings of SPIE, 0277-786X ; v. 7271".
- 2010455661 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 7271.".
- 2010455661 issued "2009".
- 2010455661 issued "c2009-".
- 2010455661 language "eng".
- 2010455661 publisher "Bellingham, Wash. : SPIE,".
- 2010455661 subject "621.3815/31 22".
- 2010455661 subject "Extreme ultraviolet lithography Congresses.".
- 2010455661 subject "Lithography, Electron beam Congresses.".
- 2010455661 subject "Masks (Electronics) Congresses.".
- 2010455661 subject "Microlithography Industrial applications Congresses.".
- 2010455661 subject "TK7872.M3 .A48 2009".
- 2010455661 title "Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States / Frank M. Schellenberg, Bruno M. La Fontaine, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc.".
- 2010455661 type "text".