Matches in Library of Congress for { <http://lccn.loc.gov/2010459315> ?p ?o. }
Showing items 1 to 24 of
24
with 100 items per page.
- 2010459315 contributor B11965258.
- 2010459315 contributor B11965259.
- 2010459315 created "c2007.".
- 2010459315 date "2007".
- 2010459315 date "c2007.".
- 2010459315 dateCopyrighted "c2007.".
- 2010459315 description "Includes bibliographical references and author index.".
- 2010459315 extent "3 v. :".
- 2010459315 identifier "0819466395".
- 2010459315 identifier "9780819466396".
- 2010459315 isPartOf "Proceedings of SPIE ; v. 6520".
- 2010459315 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 6520.".
- 2010459315 issued "2007".
- 2010459315 issued "c2007.".
- 2010459315 language "eng".
- 2010459315 publisher "Bellingham, Wash. : SPIE,".
- 2010459315 subject "621.3815/31 22".
- 2010459315 subject "Integrated circuits Masks Congresses.".
- 2010459315 subject "Manufacturing processes Congresses.".
- 2010459315 subject "Microlithography Congresses.".
- 2010459315 subject "TR940 .O698 2007".
- 2010459315 subject "X-ray lithography Congresses.".
- 2010459315 title "Optical microlithography XX : 27 February - 2 March 2007, San Jose, California, USA / Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc..".
- 2010459315 type "text".