Matches in Library of Congress for { <http://lccn.loc.gov/2010459431> ?p ?o. }
Showing items 1 to 17 of
17
with 100 items per page.
- 2010459431 contributor B11965443.
- 2010459431 contributor B11965444.
- 2010459431 date "2010".
- 2010459431 description "Includes bibliographical references.".
- 2010459431 extent "2 v. (various pagings) :".
- 2010459431 identifier "9780819480538".
- 2010459431 identifier 1.
- 2010459431 isPartOf "Proceedings of SPIE, 0277-786X ; v. 7639".
- 2010459431 issued "2010".
- 2010459431 language "eng".
- 2010459431 publisher "Bellingham, Wash. : SPIE, $c c2010.".
- 2010459431 subject "621.3815/31 22".
- 2010459431 subject "Microlithography Congresses.".
- 2010459431 subject "Photoresists Congresses.".
- 2010459431 subject "TK7874 .A3375 2010".
- 2010459431 title "Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States / Robert D. Allen, Mark H. Somervell, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States).".
- 2010459431 type "text".