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- 2010459440 contributor B11965460.
- 2010459440 contributor B11965461.
- 2010459440 created "2010.".
- 2010459440 date "2010".
- 2010459440 date "2010.".
- 2010459440 dateCopyrighted "2010.".
- 2010459440 description "Includes bibliographical references and author index.".
- 2010459440 extent "2 v. :".
- 2010459440 identifier "0819480509".
- 2010459440 identifier "9780819480507".
- 2010459440 isPartOf "Proceedings of SPIE, 0277-786X ; v. 7636".
- 2010459440 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 7636.".
- 2010459440 issued "2010".
- 2010459440 issued "2010.".
- 2010459440 language "eng".
- 2010459440 publisher "Bellingham, Wash. : SPIE,".
- 2010459440 subject "621.3815/31 22".
- 2010459440 subject "Extreme ultraviolet lithography Congresses.".
- 2010459440 subject "Lasers Industrial applications Congresses.".
- 2010459440 subject "Optical coatings Congresses.".
- 2010459440 subject "Photolithography Congresses.".
- 2010459440 subject "TK7872.M3 E986 2010".
- 2010459440 subject "Ultraviolet radiation Industrial applications Congresses.".
- 2010459440 title "Extreme ultraviolet (EUV) lithography : 22-25 February 2010, San Jose, California, United States / Bruno M. La Fontaine, editor ; sponsored by SPIE ; cooperating organization SEMATECH Inc. (United States).".
- 2010459440 type "text".