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- 2010459448 contributor B11965472.
- 2010459448 contributor B11965473.
- 2010459448 date "2010".
- 2010459448 description "Includes bibliographical references.".
- 2010459448 extent "2 v. :".
- 2010459448 identifier "0819480525".
- 2010459448 identifier "9780819480521".
- 2010459448 isPartOf "Proceedings of SPIE, 0277-786X ; v. 7638".
- 2010459448 issued "2010".
- 2010459448 language "eng".
- 2010459448 publisher "Bellingham, Wash. : SPIE, $c c2010.".
- 2010459448 subject "621.3815/48 22".
- 2010459448 subject "Integrated circuits Inspection Congresses.".
- 2010459448 subject "Integrated circuits Measurement Congresses.".
- 2010459448 subject "Microlithography Congresses.".
- 2010459448 subject "Process control Congresses.".
- 2010459448 subject "TK7874 .M43768 2010".
- 2010459448 title "Metrology, inspection, and process control for microlithography XXIV : 22-25 February 2010, San Jose, California, United States / Christopher J. Raymond, editor ; sponsored by SPIE ; cosponsored by Nova Measuring Instruments Ltd. (Israel) ; cooperating organization, SEMATECH Inc. (United States).".
- 2010459448 type "text".