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- 2010459490 alternative "Alternative lithographic technologies 2".
- 2010459490 alternative "Alternative lithographic technologies two".
- 2010459490 contributor B11965524.
- 2010459490 contributor B11965525.
- 2010459490 created "c2010.".
- 2010459490 date "2010".
- 2010459490 date "c2010.".
- 2010459490 dateCopyrighted "c2010.".
- 2010459490 description "Includes bibliographical references.".
- 2010459490 extent "1 v. (various pagings) :".
- 2010459490 identifier "0819480517".
- 2010459490 identifier "9780819480514".
- 2010459490 isPartOf "Proceedings of SPIE, 0277-786X ; v. 7637".
- 2010459490 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 7637. 0277-786X".
- 2010459490 issued "2010".
- 2010459490 issued "c2010.".
- 2010459490 language "eng".
- 2010459490 publisher "Bellingham, Wash. : SPIE,".
- 2010459490 subject "621.3815/31 22".
- 2010459490 subject "Extreme ultraviolet lithography Congresses.".
- 2010459490 subject "Lithography, Electron beam Congresses.".
- 2010459490 subject "Masks (Electronics) Congresses.".
- 2010459490 subject "Microlithography Industrial applications Congresses.".
- 2010459490 subject "TK7872.M3 A482 2010".
- 2010459490 title "Alternative lithographic technologies 2".
- 2010459490 title "Alternative lithographic technologies II : 23-25 February 2010, San Jose, California, United States / Daniel J.C. Herr, editor ; sponsored by SPIE; cooperating organization, SEMATECH Inc.".
- 2010459490 title "Alternative lithographic technologies two".
- 2010459490 type "text".